Crystal system: monoclinic
| a: | 6.1661 (±0.0003) Å |
| b: | 27.6363 (±0.0012) Å |
| c: | 8.4503 (±0.0004) Å |
| α: | 90° |
| β: | 95.712 (±0.001)° |
| γ: | 90° |
Starting materials: N-(3-aminopropyl)imidazole (API, 98%, Aldrich), PbBr2 (99.999%, Aldrich), HBr (≥40%, Beijing Chemical Industry Co., Ltd.)
Product: Single crystals
Description: A solution of PbBr2, API, and HBr was heated to 70 degrees Celsius and then cooled at 3 degrees per hour until reaching room temperature. This was performed in a nitrogen atmosphere and the crystals precipitated upon cooling.
Method: Single-crystal X-ray diffraction
Description: A Rigaku RAXIS-RAPID image plate diffractometer was used to measure SCXRD. The w-scan technique was employed, and Mo Kalpha radiation was used. The SHELXS-97 program was used to solve the structure and the SHELXL-97 program was used to refine it via the full-matrix least-squares techniques.
Starting materials: N-(3-aminopropyl)imidazole (API, 98%, Aldrich), PbBr2 (99.999%, Aldrich), HBr (≥40%, Beijing Chemical Industry Co., Ltd.), DMF
Product: Thin film on quartz substrate
Description: A solution of PbBr2, API, and HBr was heated to 70 degrees Celsius and then cooled at 3 degrees per hour until reaching room temperature. This was performed in a nitrogen atmosphere and the crystals precipitated upon cooling. Thin films were prepared via spin-coating. The crystals were dissolved into a DMF solution that was spin-coated onto a quartz substrate. The spinning cycle parameters were a spin rate of 1500 for 50 seconds and was followed by annealing the sample at 100 degrees Celsius for 20 minutes.
Method: Photoluminescence Excitation Spectroscopy
Description: A Hitachi F-4500 spectrofluorimeter using a 150 W xenon lamp was used to measure the photoluminescence excitation and emission spectra.
Starting materials: N-(3-aminopropyl)imidazole (API, 98%, Aldrich), PbBr2 (99.999%, Aldrich), HBr (≥40%, Beijing Chemical Industry Co., Ltd.), DMF
Product: Thin film on quartz substrate
Description: A solution of PbBr2, API, and HBr was heated to 70 degrees Celsius and then cooled at 3 degrees per hour until reaching room temperature. This was performed in a nitrogen atmosphere and the crystals precipitated upon cooling. Thin films were prepared via spin-coating. The crystals were dissolved into a DMF solution that was spin-coated onto a quartz substrate. The spinning cycle parameters were a spin rate of 1500 for 50 seconds and was followed by annealing the sample at 100 degrees Celsius for 20 minutes.
Method: Photoluminescence Excitation Spectroscopy
Description: A Hitachi F-4500 spectrofluorimeter using a 150 W xenon lamp was used to measure the photoluminescence excitation and emission spectra. Excitation wavelength of 360 nm was used for the emission spectra.